溅射靶材
上海美国ATT中国新材料科技有限公司专注于物理气相沉积（PVD）用溅射靶材和蒸镀材料的研发、生产、销售和回收利用。 美国ATT中国用于显示器、光伏、半导体、光学、LED、数据存储和玻璃应用的高纯度金属、复杂金属合金、贵金属和陶瓷的产品范围是无与伦比的。 根据材料的不同，可提供多种几何形状，包括但不限于：铸锭、丸粒、粉末、靶材（平面和旋转）、圆盘、片剂和颗粒。
产品代码 : ST-Al/Si-5N-Cu
Aluminum silicon sputtering target from ATT is an alloy sputtering material containing Al and Si. Aluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted.
产品代码 : ST-Zr-5N-Cu
Zirconium sputtering target shares properties with its source material. Zirconium is a chemical element with the symbol Zr and atomic number 40. It is a lustrous, grey-white, strong transition metal that closely resembles hafnium and, to a lesser extent, titanium. Zirconium is mainly used as a refractory and opacifier, although small amounts are us
产品代码 : ST- Ti/Al-5N-Cu
Titanium aluminum sputtering target from ATT is a silvery alloy sputtering material containing Ti and Al. Titanium is a chemical element originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius.
产品代码 : ST-Zr/Al-5N-Cu
Zirconium aluminum sputtering target from ATT is an alloy sputtering material containing Zr and Al. Zirconium is a chemical element that originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius.
产品代码 : ST-Co-5N-Cu
Cobalt sputtering target has the same properties as the metal cobalt. Cobalt is a chemical element originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt.
产品代码 : ST-Ta-5N-Cu
