溅射靶材
上海美国ATT中国新材料科技有限公司专注于物理气相沉积（PVD）用溅射靶材和蒸镀材料的研发、生产、销售和回收利用。 美国ATT中国用于显示器、光伏、半导体、光学、LED、数据存储和玻璃应用的高纯度金属、复杂金属合金、贵金属和陶瓷的产品范围是无与伦比的。 根据材料的不同，可提供多种几何形状，包括但不限于：铸锭、丸粒、粉末、靶材（平面和旋转）、圆盘、片剂和颗粒。
产品代码 : ST-BaTiO3-4N-Cu
Barium titanate sputtering target from ATT is an oxide sputtering material with the formula BaTiO3. Barium is the fifth element in group 2 and is a soft, silvery alkaline earth metal. Because of its high chemical reactivity, barium is never found in nature as a free element.
产品代码 : ST-LiNbO3-5N-Cu
Lithium niobate sputtering target from ATT contains Li, Nb and O. Lithium niobate (LiNbO3) is a compound of niobium, lithium, and oxygen. Its single crystals are an important material for optical waveguides, mobile phones, piezoelectric sensors, optical modulators and various other linear and non-linear optical applications.
产品代码 : ST-SiC-5N-Cu
Silicon Carbide sputtering target from ATT is a carbide ceramic sputtering material with the formula SiC. Silicon is a chemical element that originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius.
产品代码 : ST-BN-5N-Cu
Boron nitride sputtering target from ATT contains the element of B and N. Boron nitride, with “BN” as its standard chemical symbol, is a ceramic material that has the advantages of high heat capacity, excellent thermal conductivity and low dielectric constant and excellent dielectric strength.
产品代码 : ST-Si3N4-5N-Cu
Silicon nitride sputtering target is a type of nitride ceramic sputtering target. Si3N4 is a high-melting-point ceramic material that is extremely hard and relatively chemically inert. Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen.
产品代码 : ST- AlN-5N-Cu
Aluminum nitride sputtering target from ATT is a ceramic sputtering material with the formula AlN. Aluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt.
