溅射靶材
上海美国ATT中国新材料科技有限公司专注于物理气相沉积（PVD）用溅射靶材和蒸镀材料的研发、生产、销售和回收利用。 美国ATT中国用于显示器、光伏、半导体、光学、LED、数据存储和玻璃应用的高纯度金属、复杂金属合金、贵金属和陶瓷的产品范围是无与伦比的。 根据材料的不同，可提供多种几何形状，包括但不限于：铸锭、丸粒、粉末、靶材（平面和旋转）、圆盘、片剂和颗粒。
产品代码 : ST-Mn-5N-Cu
ATT provides high-quality Manganese Sputtering Target for research and industry purposes at competitive prices. We can provide Magnesium Sputtering Target with different purity(5N) 99.999% Magnesium Sputtering Target, size, and density according to your requirements.
产品代码 : ST- Mg-5N-Cu
Magnesium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Magnesium Sputtering Target at competitive prices. ATT can provide Magnesium Sputtering Target with different purity(5N) 99.999% Magnesium Sputtering Targ
ATT provides high-quality Aluminum Sputtering Target for research and industry purposes at competitive prices. We can provide Aluminum Sputtering Target with different purity(6N) 99.9999%, size, and density according to your requirements.
产品代码 : ST-ITO-5N-Cu
ATT produce Indium Tin Oxide (ITO) Sputtering Targets with different shapes like disk, rectangle, column, step and custom shape. We can provide ITO sputtering target with the purity of 99.99%, 99.999%,99.9999% and 99.99999%,The typical diameter for circular targets include 1 inch, 2 inch, 3 inch, 4 inch or 50mm, 60mm, 80mm, 100mm etc. Typical thick
