溅射靶材
上海美国ATT中国新材料科技有限公司专注于物理气相沉积（PVD）用溅射靶材和蒸镀材料的研发、生产、销售和回收利用。 美国ATT中国用于显示器、光伏、半导体、光学、LED、数据存储和玻璃应用的高纯度金属、复杂金属合金、贵金属和陶瓷的产品范围是无与伦比的。 根据材料的不同，可提供多种几何形状，包括但不限于：铸锭、丸粒、粉末、靶材（平面和旋转）、圆盘、片剂和颗粒。
产品代码 : ST- ZnSe-5N-Cu
Zinc selenide sputtering target is a type of selenide ceramic sputtering target composed of zinc and selenium . Zinc is a chemical element originated from the German, ‘zinc’, which may in turn be derived from the Persian word ‘sing’, meaning stone. It was early used before 1000 BC and discovered by Indian metallurgists.
产品代码 : ST-YF3-5N-Cu
Yttrium fluoride sputtering target is a type of fluoride ceramic sputtering target composed of yttrium and fluorine. Yttrium is a chemical element originated from Ytterby, Sweden. It was first mentioned in 1794 and observed by J. Gadolin. The isolation was later accomplished and announced by G. Mosander.
产品代码 : ST-MgF2-5N-Cu
Magnesium fluoride sputtering target from ATT is an inorganic compound with the formula MgF2. Magnesium fluoride is a white crystalline salt and is transparent over a wide range of wavelengths, with commercial uses in optics that are also used in space telescopes. It occurs naturally as the rare mineral sellaite.
产品代码 : ST- Nb2O5-5N-Cu
Niobium oxide sputtering target from ATT is an oxide sputtering material containing Nb and O. Niobium is a chemical element that originated from Niobe, daughter of king Tantalus from Greek mythology. It was first mentioned in 1801 and observed by C. Hatchett. The isolation was later accomplished and announced by W. Blomstrand.
产品代码 : ST- Ta2O5-5N-Cu
Tantalum oxide sputtering target from ATT is an oxide sputtering material containing Ta and O. Tantalum is a chemical element that originated from King Tantalus, the father of Niobe from Greek mythology. It was first mentioned in 1802 and observed by G. Ekeberg. “Ta” is the canonical chemical symbol of tantalum.
产品代码 : ST- Al2O3-5N-Cu
Aluminum oxide sputtering target from ATT contains Al and O, and it has the same properties as aluminum oxide. Aluminum oxide, or Al2O3, is the most commonly occurring of several aluminum oxides, and specifically identified as aluminum (III) oxide.
